Computer simulation programs for Electrodeposition / Electroplating - FARADAY and ELECHEM

 

Originally published on 4–May–2013

 

FARADAY and ELECHEM are the two portable computer programs, find useful for electrochemical researchers, electroplating units, battery as well as supercapacitor industries, process engineers, materials scientists & engineers, electroplaters, hobbyists, and students to evaluate various electrochemical deposition parameters.

 

These computational tools can be used to simulate various electrochemical deposition data or electroplating parameters for metals, alloys, composites, and some of them are listed below:

 

·       cathode / cathodic current efficiency on electro plating

·       energy required for element or metal electrodeposition

·       current density calculations

·       estimation of energy efficiency

·       Hull cell data for the given current

·       throwing power of the chemical bath based on Harring Blum cell

·       applied current required for plating of metals and alloys

·       microhardness of the deposits

·       weight of the metal or element deposited from current

·       thickness of the deposit films

·       duration required for the deposition

·       cost estimation for deposition

·       electrochemical equivalent of elements or metals

·       anode / anodic current efficiency

 

Designed by:

Dr. M Kanagasabapathy, Associate Professor

Department of Chemistry

Rajapalayam Rajus’ College

Affiliated to Madurai Kamaraj University

Rajapalayam, (TN) INDIA 626117

 

 

 

For codes & bugs, please write to me.

 

 

Screenshots

 

 




DOWNLOAD

Download ELECHEM & FARADAY (Electrochemical)